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Study of internal stresses in aluminum layers evaporated on dielectric surfaces
dc.contributor.author | Shimanovich, D. | |
dc.date.accessioned | 2018-03-28T06:09:58Z | |
dc.date.available | 2018-03-28T06:09:58Z | |
dc.date.issued | 2014 | |
dc.identifier.citation | Shimanovich D. Study of internal stresses in aluminum layers evaporated on dielectric surfaces / D. Shimanovich // Современные инновационные технологии подготовки инженерных кадров для горной промышленности и транспорта 2014 = Contemporary Innovation Technique of the Engineering Personnel Training for the Mining and Transport Indusnry 2014 : сб. науч. тр. междунар. конф., 27-28 марта 2014 г., Украина, Днепропетровск / [орг. комитет: П. И. Пилов и др.] ; М-во образования и науки Украины, Гос. высш. учеб. заведение "Нац. горн. ун-т" [и др.]. — Днепропетровск : НГУ, 2014. — C. 328-330. | ru_RU |
dc.identifier.uri | http://ir.nmu.org.ua/handle/123456789/151811 | |
dc.description.abstract | Analysis of internal stresses in evaporated aluminum layers formed at various sputtering regimes is demonstrated. Dependences of internal stresses on the thickness of aluminum films deposited at various substrate temperatures and evaporation rates are studied. | ru_RU |
dc.language.iso | en | ru_RU |
dc.subject | internal stresses | ru_RU |
dc.subject | aluminum layer | ru_RU |
dc.subject | deposition | ru_RU |
dc.subject | sputtering regimes | ru_RU |
dc.subject | modulus of elasticity | ru_RU |
dc.title | Study of internal stresses in aluminum layers evaporated on dielectric surfaces | ru_RU |
dc.type | Article | ru_RU |
dc.identifier.udk | 620.1 | ru_RU |