Study of internal stresses in aluminum layers evaporated on dielectric surfaces
Date Issued
2014
Author(s)
Shimanovich, D.
Abstract
Analysis of internal stresses in evaporated aluminum layers formed at
various sputtering regimes is demonstrated. Dependences of internal stresses on the
thickness of aluminum films deposited at various substrate temperatures and evaporation
rates are studied.
various sputtering regimes is demonstrated. Dependences of internal stresses on the
thickness of aluminum films deposited at various substrate temperatures and evaporation
rates are studied.
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